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1. Identificação
Tipo de ReferênciaArtigo em Revista Científica (Journal Article)
Sitemtc-m16b.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador6qtX3pFwXQZGivnK2Y/QATxz
Repositóriosid.inpe.br/mtc-m17@80/2007/06.29.18.47   (acesso restrito)
Última Atualização2007:06.29.18.47.45 (UTC) administrator
Repositório de Metadadossid.inpe.br/mtc-m17@80/2007/06.29.18.47.46
Última Atualização dos Metadados2018:06.05.03.34.34 (UTC) administrator
Chave SecundáriaINPE--PRE/
ISSN0257-8972
Chave de CitaçãoKostovBarrUeda:2007:EfTaBi
TítuloEffect of target bias on magnetic field enhanced plasma immersion ion implantation
Ano2007
Data de Acesso21 maio 2024
Tipo SecundárioPRE PI
Número de Arquivos1
Tamanho787 KiB
2. Contextualização
Autor1 Kostov, K. G.
2 Barroso, Joaquim José de
3 Ueda, Mário
Grupo1
2 LAP-INPE-MCT-BR
3 LAP-INPE-MCT-BR
Afiliação1 Faculdade de Engenharia de Guaratinguetá. Universidade Estadual Paulista. (UNESP.FEG)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
RevistaSurface and Coatings Technology
VolumeIn press
Histórico (UTC)2007-12-19 16:39:26 :: simone -> administrator ::
2012-10-23 23:55:58 :: administrator -> simone :: 2007
2013-02-20 15:20:00 :: simone -> administrator :: 2007
2018-06-05 03:34:34 :: administrator -> marciana :: 2007
3. Conteúdo e estrutura
É a matriz ou uma cópia?é a matriz
Estágio do Conteúdoconcluido
Transferível1
Tipo do ConteúdoExternal Contribution
Palavras-ChavePIII
Computer simulation
Magnetic field
Sheath
ResumoRecent studies have demonstrated that sheath dynamics in plasma immersion ion implantation (PIII) is significantly affected by an external magnetic field, especially in the case when the magnetic field is parallel to the workpiece surface or intersects it at small angles. In this work we report the results from two-dimensional, particle-in-cell (PIC) computer simulations of magnetic field enhanced plasma immersion implantation system at different bias voltages. The simulations begin with initial low-density nitrogen plasma, which extends with uniform density through a grounded cylindrical chamber. Negative bias voltage is applied to a cylindrical target located on the axis of the vacuum chamber. An axial magnetic field is created by a solenoid installed inside the target holder. A set of simulations at a fixed magnetic field of 0.0025 T at the target surface is performed. Secondary electron emission from the target subjected to ion bombardment is also included. It is found that the plasma density around the cylindrical target increases because of intense background gas ionization by the electrons drifting in the crossed E × B fields. Suppression of the sheath expansion and increase of the implantation current density in front of the high-density plasma region are observed. The effect of target bias on the sheath dynamics and implantation current of the magnetic field enhanced PIII is discussed.
ÁreaFISPLASMA
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4. Condições de acesso e uso
Idiomaen
Arquivo Alvoeffect of target.pdf
Grupo de Usuáriosadministrator
simone
Visibilidadeshown
Política de Arquivamentodenypublisher denyfinaldraft24
Permissão de Leituradeny from all and allow from 150.163
5. Fontes relacionadas
Unidades Imediatamente Superiores8JMKD3MGPCW/3ET2RFS
DivulgaçãoWEBSCI; PORTALCAPES.
Acervo Hospedeirolcp.inpe.br/ignes/2004/02.12.18.39
cptec.inpe.br/walmeida/2003/04.25.17.12
6. Notas
Campos Vaziosalternatejournal archivist callnumber copyholder copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository month nextedition notes number orcid pages parameterlist parentrepositories previousedition previouslowerunit progress project readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype
7. Controle da descrição
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